http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010089151-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2001-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_576eaea22bd674dc19988cb6195b1be9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d89d07d230ca200e242f2ab4f27c817a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_98f013b9fbfadcb1479fd616f0a75342 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2659735b63ca975a440026ec8b41cca4 |
| publicationDate | 2001-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010089151-A |
| titleOfInvention | Method for decreasing surface defects of patterned resist layer |
| abstract | (a) forming a photoresist layer of a positive chemically amplified photoresist composition on the substrate surface, (b) patterning the photoresist layer with actinic radiation, and (c) the patterned photoresist A method of reducing surface defects of a patterned photoresist layer on a substrate surface obtained by post-exposure bake treatment of a layer and (d) development is disclosed. The method can be achieved by contacting the photoresist layer after the post-exposure bake treatment with an acidic aqueous solution having a pH of 3.5 or less for 1 to 90 seconds. The acid contained in the acidic aqueous solution is preferably aromatic sulfonic acid or, more preferably, diphenyl ether sulfonic acid such as dodecyl (diphenyl ether) disulfonic acid. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7258963-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150080434-A |
| priorityDate | 2000-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 111.