http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010085962-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D21-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D21-14 |
| filingDate | 2000-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2001-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010085962-A |
| titleOfInvention | Method for measuring leveler concentration of plating solution, and method and apparatus for controlling plating solution |
| abstract | In the present invention, the leveler concentration in the plating liquid of the plating apparatus used to fill metals such as copper in the wiring grooves and holes formed on the surface of the semiconductor substrate or the like is measured in the peeling region of the plating liquid measured by the CV method or the CVS method. The peak value area (Ar value) is obtained. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100885369-B1 |
| priorityDate | 1999-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.