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filingDate 2001-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2001-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20010082405-A
titleOfInvention Plasma dicing method and apparatus
abstract The present invention relates to a method and apparatus for dicing a semiconductor wafer. The processing of ultra-fine dicing streets is possible, there is no chipping, and the uniform precision of the dicing line is maintained throughout the wafer. In addition, a method and apparatus for dicing semiconductor wafers for semiconductor chip manufacturing, which are suitable for dicing ultra-thin wafers stably, improving yield in large-diameter wafers, and performing automatic cleaning not only for dicing itself but also after dicing. In providing.
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