http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010070303-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31667 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31612 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-02 |
| filingDate | 2000-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da424ca0877cd0717a468cb98126b375 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc5699e7570fc6881b60360e571260c6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50eb8240ef3f2bcb0d209ac6b5884e2f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84400edc82a126124edc22d8da891362 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1b795b6b810687e8ced11a2757abcb8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5061b4fd628c04cc5672a726d8a971f6 |
| publicationDate | 2001-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010070303-A |
| titleOfInvention | Antireflection film, process for forming the antireflection film, and antireflection glass |
| abstract | Silicon Compound (A) of Formula 1n n n [Formula 1]n n n Si (OR) 4 n n n ( Wherein R is a C 1-5 alkyl group),n n n Silicon compound of formula (B)n n n [Formula 2]n n n R 1 Si (OR 2 ) 3 n n n ( Wherein R 1 is a C 1-18 organic group and R 2 is a C 1-5 alkyl group),n n n Alcohol (C) of Formula 3n n n [Formula 3]n n n R 3 CH 2 OHn n n (Wherein R 3 is a hydrogen atom or an unsubstituted or substituted C 1-12 alkyl group),n n n And oxalic acid (D) in a molar ratio of 0.05 to 4.5 moles of silicon compound (B) per mole of silicon compound (A), alcohol per mole of total alkoxy groups contained in silicon compounds (A) and (B) 0.5 Preparing a reaction mixture comprising a ratio of from 100 moles to 0.2 moles of oxalic acid per mole of total alkoxy groups contained in the silicon compounds (A) and (B); The total amount of silicon compounds (A) and (B) remaining in the reaction mixture is 5 mol% or less, while maintaining the SiO 2 concentration from 0.5 to 10% by weight as calculated from silicon atoms in the reaction mixture and maintaining the absence of water. Until the reaction mixture is heated to a temperature of 50 to 180 ° C. to form a polysiloxane solution; Coating a polysiloxane solution on the glass surface to form a coating film; An antireflective film having a refractive index of 1.33 to 1.38 and a water contact angle of 40 ° or less, formed by attaching to a glass surface by thermosetting the coating film at a temperature of 480 to 520 ° C. |
| priorityDate | 1999-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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