| abstract |
The present invention relates to (a) hydroxylamines, (b) aromatic hydroxy compounds, (c) benzotriazole compounds, (d) amines having an acid dissociation constant (pKa) in an aqueous solution at 25 ° C of 7.5 to 13, and (e A photoresist stripping solution containing a water-soluble organic solvent and / or (f) water, and a photoresist stripping method using the same, and in particular, a stripping of a photoresist film and a deterioration film suitably used for the production of a liquid crystal panel device. It is to provide a photoresist stripper composition excellent in properties, excellent in corrosion resistance of a substrate on which both a metal wiring and an inorganic material layer are formed, and a photoresist stripping method using the same. |