| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d4ada69388e0a1b68daaf536597c732 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31695
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J9-02 |
| filingDate |
2000-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c386cc1c8bbff2182d3669a834e3495 |
| publicationDate |
2001-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20010057563-A |
| titleOfInvention |
Method for making nanoporous silicone resins from alkylhydridosiloxane resins |
| abstract |
(A) contacting a hydridosilicone containing resin with 1-alkene having 8 to 28 carbon atoms in the presence of a platinum group metal containing hydrosilylation catalyst so that at least 5% of the silicon atoms are substituted with at least one alkyl group having 8 to 28 carbon atoms and at least 45% Sufficient temperature to form an alkylhydridosiloxane resin in which silicon atoms are substituted with one or more hydrogen atoms, and (B) to cure the alkylhydridosiloxane resin of step (A) and to pyrolyze alkyl groups having 8 to 28 carbon atoms from the silicon atoms. A method of making nanoporous silicone resins that can be used to form low dielectric constant films useful for electrically insulating coatings of electronic devices, including forming nanoporous silicone resins by heating at is described. |
| priorityDate |
1999-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |