http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010057018-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b1007735376d07808ebe297f823b2829 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F2201-123 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1368 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-136227 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-136 |
| filingDate | 1999-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba3da3f9ca182e94252a8fa0af1cb7eb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a58afe825b2a14c10341beb9d35bc96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99198d233712e594ab3c444275696b4f |
| publicationDate | 2001-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010057018-A |
| titleOfInvention | Method of Fabricating Liquid Crystal Display Device |
| abstract | The present invention relates to a method for manufacturing a liquid crystal display device, comprising: a thin film transistor comprising a gate electrode, a gate insulating film, an active layer, an ohmic contact layer, a source and a drain electrode on a transparent substrate, wherein the transparent Forming a passivation layer covering the thin film transistor on the substrate; forming a contact hole for patterning the passivation layer to expose the drain electrode; and forming a contact hole in the passivation layer to contact the drain electrode through the contact hole. Forming a pixel electrode by patterning the transparent conductive layer to expose the passivation layer in a portion corresponding to the thin film transistor; and cleaning the surface by surface treating the pixel electrode with SF 6 plasma. Process.n n n Accordingly, in the method of manufacturing the liquid crystal display according to the present invention, after forming indium zinc oxide (IZO) and stripping the photoresist when forming the pixel electrode, each of the liquid crystal display device using SF 6 plasma in a dry etching apparatus, respectively. Since the first and second surface treatments, the generation of organic foreign matter on the surface is suppressed to prevent an increase in sheet resistance and a decrease in surface uniformity. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100955384-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8685625-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8283112-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100507281-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7977037-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030021378-A |
| priorityDate | 1999-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.