| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2000-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4900f5107982c3eaa801f05ac37a016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_609289ed8cf2435974d1ed9b23bce907
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a51be7116a241fb587bd009710d904e7 |
| publicationDate |
2001-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20010051692-A |
| titleOfInvention |
Negative-working photolithographic patterning material and method for the preparation of ion-implanted and metal-plated substrates by using the same |
| abstract |
A negative photolithography patterning material is disclosed, comprising a negative photoresist layer of relatively thick thickness and a substrate on a substrate surface suitable for forming a patterned masking layer during patterned ion implantation or metal plating. The negative photoresist layer is formed from a negative chemically amplified photoresist composition composed of an alkali-soluble resin component, a radiation-sensitive acid generator, and a crosslinking agent, and the alkali-soluble resin component is formaldehyde and m- as a phenol reagent. Cresol sole is m-cresol novolak resin or a combination of m-cresol novolak resin and polyhydroxystyrene resin prepared by an acid catalyzed condensation reaction, of which at least 50% by weight is m-cresol novolak resin It is characterized by. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101877029-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100796584-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11586109-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017196010-A3 |
| priorityDate |
1999-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |