| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2602-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-013
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-08 |
| filingDate |
2000-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f33c7a0d5428cba3ecb7e4a5f532327b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11355faa63f879a3ac06602faf324cf5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0da5708bb45d88b87a655a2817fdc610 |
| publicationDate |
2001-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20010050920-A |
| titleOfInvention |
Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same |
| abstract |
The present invention includes a polymer and a photoresist composition containing the polymer as a resin binder component. Photoresists of the invention include chemically amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, especially 193 nm. The polymers of the present invention contain nitrile and alicyclic moieties, in particular photoacid labile groups having crosslinked bicyclic or tricyclic groups or other caged groups. The polymers and resists of the present invention may exhibit substantial resistance to plasma etchant. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100452415-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100678647-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030055874-A |
| priorityDate |
1999-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |