| abstract |
In the present invention, there is provided a method for treating a sample, a processing apparatus, and a method for manufacturing a magnetic head using the same. A high etching rate at a low sample temperature, a simple anti-corrosion treatment for removing residual chlorine by liquid cleaning, and a corrosive substance are provided. Characterized in removal methods such as post-treatment process for removal. The method of the present invention comprises the steps of forming a laminated film consisting of a seed layer of NiFe alloy, an upper pole of the NiFe alloy connected to the seed layer, a gap layer of an oxide film in close contact with the seed layer, and a shield layer of NiFe alloy in close contact with the gap layer. ; Plasma etching the seed layer using a gas containing chlorine using the upper magnetic pole as a mask; And it is characterized by consisting of a step of drying after removing the residual chlorine component by liquid cleaning. |