http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010050495-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2000-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5fa01dd042e4435f4e9e89f0e3f9ff69 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7078bf6026b8eb8f789155ae6b65fffd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2113184180e029b99bc7519cffd6446c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_381de81b1f3fad7df1c4007aacaa45f8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8299e5d23e6728a39d8a6cf557471f68 |
| publicationDate | 2001-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010050495-A |
| titleOfInvention | Radiation-Sensitive Resin Composition |
| abstract | The present invention relates to a radiation-sensitive resin composition, and more particularly, microfabrication using various radiations such as X-rays such as KrF excimer laser or ArF excimer laser, X-rays such as syncrotron radiation, and charged particle beams such as electron beams. A radiation sensitive resin composition which can be suitably used as a chemically amplified resist useful in the present invention.n n n The radiation-sensitive resin composition of the present invention comprises (A) a repeating unit (I) of the following formula (1), a repeating unit (II) of the formula (2), and a repeating unit (III-1) of the formula (3) An alkali insoluble or alkali poorly soluble acid dissociable group-containing resin having at least one selected from unit (III-2), wherein the resin becomes alkali-soluble when the acid dissociable group is dissociated, and (B) radiation-sensitive acid generation. Contains agent.n n n n n n n n n n n n n n n n n n n n n n n n n n n n n n n Wherein A and B independently of one another represent a hydrogen atom or a linear or branched alkyl group having 1 to 4 carbon atoms, and X and Y independently of each other contain a hydrogen atom, a monovalent oxygen atom-containing polar group or a monovalent nitrogen atom A polar group, at least one of X and Y is the oxygen atom-containing polar group or the nitrogen atom-containing polar group, or X and Y are one to form a dicarboxylic acid anhydride group, n is an integer of 0 to 2, and R is 1 represents a hydrogen atom or a methyl group, R 2 represents a group represented by the following formula (5), and R 4 represents a C 3 to C 15 divalent hydrocarbon group having an alicyclic skeleton.n n n n n n n n n n Wherein each R 3 independently of one another represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof or a linear or branched alkyl group having 1 to 4 carbon atoms, and at least one of R 3 is the alicyclic type A hydrocarbon group or a derivative thereof, or any two R 3 's are bonded to each other to form a divalent alicyclic hydrocarbon group or a derivative thereof having 4 to 20 carbon atoms with the carbon atoms to which each is bonded, and the remaining R 3 is carbon atoms The linear or branched alkyl group of 1 to 4 or a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof is shown. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8129092-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100751739-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100758893-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100518993-B1 |
| priorityDate | 1999-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 841.