http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010043974-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2000-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2001-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010043974-A |
| titleOfInvention | Radiation-sensitive resin composition |
| abstract | The present invention relates to a radiation-sensitive resin composition which is excellent in various properties required for photosensitive resists such as sensitivity, pattern shape, heat resistance, and the like, and has a balance of these various properties. The radiation-sensitive resin composition contains a photosensitive agent containing an alkali-soluble resin and a quinonediazide group. The alkali-soluble resin is composed of a phenol novolak resin, and the novolak resin is treated by a thin film distillation method to selectively monomers and dimers. The removed one is used. In the thin film distillation, the novolak resin before the treatment was subjected to gel permeation chromatography using a 280 nm detector, the polymer region of the pattern A 1 , the middle molecule region B 1 , and the monomer / dimer region C 1. a, and when that of the novolak resin after the treatment with each of a 2, B 2, C 2, and the area ratio, B 2 / B 1 is more than 0.95, C 2 / (a 2 + B 2 + C 2) is 0.060 It is preferable that it is the following. |
| priorityDate | 1999-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 137.