http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010040199-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-167 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2000-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47e8dbdd5470e6c22ab2c24af36cd932 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab6634ca20f6c9930f5ef98949495687 |
| publicationDate | 2001-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010040199-A |
| titleOfInvention | Light exposure method |
| abstract | It is an exposure method for the ultrafine processing of the semiconductor which improves the light transmittance of the resist layer in the wavelength range of extreme ultraviolet (EUV), and enables the above ultrafine processing. In exposing the resist layer selectively with X-rays, a polymer material constituting the resist layer, wherein at least a part of hydrogen atoms, which are existing resist materials, contain a substituent containing an alkyl group and / or The polymeric material substituted by the substituent containing an aromatic ring is used. By substituting a hydrogen atom of the polymer material with a substituent containing an alkyl group or a substituent containing an aromatic ring, as a result, the proportion of oxygen atoms in the whole atoms constituting the polymer material is relatively small, resulting in optical absorption of the entire polymer material. Is suppressed. |
| priorityDate | 1999-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458392451 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457623688 |
Total number of triples: 21.