http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010040187-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2000-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601ba4a71019c4ad5d4dff3748ba6624 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 |
| publicationDate | 2001-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010040187-A |
| titleOfInvention | Positive photoresist composition |
| abstract | The present invention is characterized by using an acid-decomposable polymer containing at least one repeating unit represented by the following general formula (I) and at least one repeating unit represented by the following general formulas (IIa) and (IIb). Photoresist composition, andn n n (A) A compound which generates an acid by irradiation with actinic light or radiation, (B) at least one of repeating units represented by the following general formula (I) and at least one represented by the following general formulas (II) and (IIb) 1 selected from an acid-decomposable polymer containing a repeating unit, (C) at least one solvent which dissolves said (A) and (B), (D) organobasic compound, and (E) fluorine type, silicone type, and nonionic type | system | group. It consists of a positive photoresist composition, characterized in that it contains at least two surfactants. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100795109-B1 |
| priorityDate | 1999-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 401.