http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010040163-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2000-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45c252583cde8d06ccecefeda60d1649 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_464180103f87187b3aab20511a8537b7 |
| publicationDate | 2001-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010040163-A |
| titleOfInvention | Positive photoresist composition |
| abstract | The present invention provides a positive photoresist composition having high resolution, preventing the resist pattern lower portion from becoming a hem shape, and having a vertical sidewall angle of the pattern.n n n The present invention relates to a structural unit represented by formula (I), (II) and (III) (wherein R 1 and R 2 are hydrogen atoms or methyl groups, R 4 is alkyl groups, aralkyl groups, aryl groups or- YOC (= O) -Z group (Y is an alkylene group having 1 to 20 carbon atoms, Z is an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms or an aralkyl group having 7 to 20 carbon atoms), and R 3 is a hydrogen atom Or a methyl group, X represents a group having a saturated condensed polycyclic hydrocarbon or a saturated monovalent exchange hydrocarbon}, (b) a compound which generates an acid by irradiation with actinic light or radiation, and (c) Positive photoresist composition containing a solvent. |
| priorityDate | 1999-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 248.