http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010031542-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S525-903 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2383-04 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31058 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-0427 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 |
| filingDate | 1999-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2001-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010031542-A |
| titleOfInvention | Coating liquid for forming a silica-containing film with a low-dielectric constant and substrate coated with such a film |
| abstract | The present invention can form a low-density insulating film having a dielectric constant of 3 or less and has a low-dielectric constant that is excellent in adhesion to the substrate and film strength as well as resistance to adaptation processes such as oxygen plasma and etching operations. To provide a coating liquid for forming a silica-comprising film. Furthermore, to provide a substrate obtained using the coating liquid and coated with a silica-comprising film having the above characteristics. The coating liquid for forming the silica-comprising film having a low-dielectric constant comprises a polymer composition composed mainly of (i) polysiloxane and (ii) resin that is easily decomposed, the polysiloxane being followed by fine silica particles. Is a reaction product between at least one alkoxysilane represented by formula (I)n n n X n Si (OR) 4-n (I),n n n Wherein X represents a hydrogen atom, a fluorine atom, an unfluorinated or fluorinated alkyl group, aryl group or vinyl group of 1 to 8 carbon atoms; R represents a hydrogen atom, an alkyl group of 1 to 8 carbon atoms, an aryl group or a vinyl group; And n is an integer of 0-3. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160040587-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180099578-A |
| priorityDate | 1998-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 93.