http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010026467-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 1999-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b9fac02403454d2db150938beddd852 |
publicationDate | 2001-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20010026467-A |
titleOfInvention | Crosslinker used for silylation and photoresist composition containing the same |
abstract | The present invention relates to a novel photoresist crosslinking agent for silylation and a photoresist composition comprising such a crosslinking agent, wherein the crosslinking agent of the present invention comprising two or more epoxy groups as in the compound of Formula 1 It is used in the sililation process because it forms a precise crosslink even with a small amount of energy and a photoresist resin suitable for the process, and has heat resistance to withstand the post-exposure bake process and the silylation process with high temperature during the process accompanying the TSI process. It can be usefully used as a crosslinking agent of the photoresist.n n n [Formula 1] |
priorityDate | 1999-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.