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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
filingDate 1999-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b9fac02403454d2db150938beddd852
publicationDate 2001-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20010026467-A
titleOfInvention Crosslinker used for silylation and photoresist composition containing the same
abstract The present invention relates to a novel photoresist crosslinking agent for silylation and a photoresist composition comprising such a crosslinking agent, wherein the crosslinking agent of the present invention comprising two or more epoxy groups as in the compound of Formula 1 It is used in the sililation process because it forms a precise crosslink even with a small amount of energy and a photoresist resin suitable for the process, and has heat resistance to withstand the post-exposure bake process and the silylation process with high temperature during the process accompanying the TSI process. It can be usefully used as a crosslinking agent of the photoresist.n n n [Formula 1]
priorityDate 1999-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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