| abstract |
It is an object of the present invention to provide an aqueous photosolder resist composition having no problem of storage stability, excellent heat resistance and no solvent smell.n n n (A) A compound having a cyclic ether group other than an aqueous solution obtained by neutralizing a resin containing a radical polymerizable group and a carboxyl group with a base, (B) an inorganic filler, (C) a polyfunctional acrylic monomer (c1), and a glycidyl group. And an aqueous photosolder resist composition comprising a photocurable mixture comprising a photopolymerization initiator (c3) and, if necessary, (D) an aqueous solution obtained by neutralizing a radical polymer having an acid value of 130 to 230 mg KOH / g with a base, wherein the glycy Cyclic ether groups other than a dill group are an alicyclic epoxy group or an oxetane group, for example. |