http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010015400-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2000-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601ba4a71019c4ad5d4dff3748ba6624 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4777e38204f9f24001cd48b964f0099c |
| publicationDate | 2001-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010015400-A |
| titleOfInvention | Positive photoresist composition for far ultraviolet exposure |
| abstract | Resin which contains compound (A) which can generate an acid by irradiation of actinic rays or radiation, and a repeating unit having a group represented by the following formula (I), and which can be decomposed by the action of acid to increase solubility in alkali (B A positive photoresist composition comprising:n n n n n n n n Wherein, R 6 and R and at least one is excluded hydrogen atom groups in the 7, R 6 and R 7 are combined there to form a ring, R 1 is an alkyl group having from 1 to 4 carbon atoms which may have a hydrogen atom or a substituent R 2 to R 7 may be the same or different and each represents a hydrogen atom, an alkyl group which may have a substituent, a cycloalkyl group which may have a substituent or an alkenyl group which may have a substituent, and m and n are If it is not 0 at the same time, m and n represent 0 or 1 separately. The positive photoresist composition comprises fluorine-containing surfactants and / or silicon-containing surfactants, and propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, methyl 3-methoxypropionate, ethyl 3-meth It may further comprise one or more solvents selected from oxypropionate, methyl 3-ethoxypropionate and ethyl 3-ethoxypropionate. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100972129-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100950508-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100907268-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100920164-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160028987-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100885691-B1 |
| priorityDate | 1999-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 375.