http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010014307-A

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filingDate 1998-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2001-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20010014307-A
titleOfInvention Method and apparatus for reducing deposition of contaminants
abstract Systems and methods are known for reducing the rate at which volatile contaminants are deposited on one or more optical components of a substrate processing system. Purification fluid is introduced into the control system at the inner surface of the treatment system. The flow of purge fluid is generated across the inner surface to form a contaminant capture barrier between the source of the volatile contaminants and the one or more optical components, thereby reducing the rate at which volatile contaminants are deposited on the optical components of the system. Purification fluid is mostly removed from the treatment system.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100709517-B1
priorityDate 1997-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 28.