| abstract |
A photosensitive polymer having an alicyclic compound and an acetal functional group in a backbone, a photosensitive copolymer comprising the same, and a resist composition obtained therefrom are disclosed. The photosensitive polymer which concerns on this invention has a following formula, and a weight average molecular weight is 5,000-100,000.n n n n n n n n Wherein R 1 is hydrogen or a methyl group, R 2 and R 3 are each a hydrogen, methyl, ethyl or methoxy group, and R 4 is a C 1 to C 20 aliphatic or alicyclic saturated compound. |