| abstract |
The present invention includes the interior of a coater cup to clean the applicator, to remove unnecessary resist from the substrate during or after application of the resist, to remove the resist from the substrate after the resist is used as intended, The present invention relates to a cleaning agent for lithography, which is useful for cleaning or cleaning a substrate from which a resist has been removed and useful for other purposes, and having excellent ability to dissolve the resist and being very safe for human body. The detergent consists of propylene glycol alkyl ether, propylene glycol alkyl ether acetate, ethylene glycol alkyl ether, ethylene glycol alkyl ether acetate, alkyl acetate, alkyl propionate, alkyl alkoxypropionate, alkyl lactate, aliphatic ketones and alkoxybutanol A homogeneous solution comprising at least one organic solvent selected from the group and at least one alcohol selected from alcohols each having an alkyl group of 1 to 4 carbon atoms. |