| abstract |
A peeling liquid composition for photoresists comprising (a) alkanoylamines, (b) sugars, (c) water-soluble organic solvents, (d) benzotriazole or derivatives thereof, and (e) water, and photoresist using the same A peeling method is disclosed. Advantageous Effects of Invention According to the present invention, a peeling liquid composition for photoresist that is excellent in the peelability of a photoresist film, which is particularly preferably used for the manufacture of liquid crystal panel elements, and excellent in corrosion protection of a substrate on which both metal wiring and an inorganic material layer are formed. And a photoresist stripping method using the same. |