| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f40906e3656f631e0faaa5feae983aff |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-1224
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-125
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-362
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-127 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate |
1997-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c0e300641048efccf3efce12d999067
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7de42c934f073f445fc34f45ba2efe64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8754a7bee783455bce1539ebd89e2d7b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a2269c79d687d67d18786286348d911 |
| publicationDate |
2000-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20000036020-A |
| titleOfInvention |
Laser removal of foreign materials from surfaces |
| abstract |
The present invention is a method for completely and quickly removing organic and inorganic foreign matter from these substrates without any damage to the substrate, these foreign substances include particles of ultra-fine particles such as heavy metals and alkali elements, The removal of foreign substances is performed by irradiating the surface of the substrate with a UV laser. This removal process is performed in the reaction gas of the oxygen base, and the removal process is performed by the gas containing F and / or Cl atoms in the reaction gas molecules. It is a method for removing foreign matter from a substrate by a laser that comprises performing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE47781-E
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7387557-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7521857-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7915811-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8558455-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7247986-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101032969-B1 |
| priorityDate |
1996-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |