http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20000035505-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7fdcadee05d0eb631c65817e032bf008 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate | 1999-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d26f16f44d3a975af35bc076959451ac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88a6ac5c8933ac582771b45113905be6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d345c98951a520ecace77ae72f8aead http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4d8988f4eabb43be15071893c0facff http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9d550fff803d079412989254a06ffb1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d6ed896c8a9616ace141ebfd092ac86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09861d0d891299504e254b2ab7e130a4 |
| publicationDate | 2000-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20000035505-A |
| titleOfInvention | Polishing composition and rinsing composition |
| abstract | (Problem) In the polishing of sub-straight mirrors used in memory hard disks, the polishing rate is higher than that of the conventional polishing composition, the antifoaming property is high, and fine pits, micro projections and other surfaces are polished. In the polishing composition and the pretreatment and / or post-treatment of the mirror polishing of the substraightness, which can prevent the occurrence of defects, the antifoaming property is higher than that of the conventional rinse composition, Providing a rinse composition capable of sufficiently removing the chip).n n n (Solution means) A polishing composition comprising the following components (a) to (d) and a rinsing composition comprising the components (a) to (c) below.n n n (a) water,n n n (b) at least one compound selected from the group consisting of polystyrenesulfonic acid and salts thereof,n n n (c) a compound selected from the group consisting of inorganic acids, organic acids and salts thereof other than component (b), andn n n (d) at least one abrasive selected from the group consisting of aluminum oxide, silicon dioxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101126530-B1 |
| priorityDate | 1998-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 139.