| abstract |
A polymer compound having a weight average molecular weight of 1,000 to 500,000 containing an ester compound represented by the following formula (1a) as a structural unit.n n n n n n n n n n In the formula,n n n R 1 represents a hydrogen atom, a methyl group or CH 2 CO 2 R 14 ,n n n R 2 represents a hydrogen atom, a methyl group or CO 2 R 14 ,n n n R 3 represents a linear, branched or cyclic alkyl group having 1 to 8 carbon atoms or an aryl group which may be substituted with 6 to 20 carbon atoms,n n n R 4 to R 13 each independently represent a hydrogen atom or a monovalent hydrocarbon group which may include a hetero atom having 1 to 15 carbon atoms, and may form a ring with each other, in which case include a hetero atom having 1 to 15 carbon atoms Represents a divalent hydrocarbon group,n n n In addition, R 4 to R 13 may be bonded to each other without bonding between adjacent carbons, may form a double bond,n n n R 14 represents a linear, branched or cyclic alkyl group having 1 to 15 carbon atoms.n n n Since the resist material using the polymer compound of the present invention as a base resin is sensitive to high energy rays and excellent in sensitivity, resolution, and etching resistance, it is useful for microfabrication by electron beam or far ultraviolet rays. Since the absorption at the exposure wavelength of the ArF excimer laser and the KrF excimer laser is small, it is possible to easily form a fine and perpendicular pattern to the substrate. |