http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20000029272-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_041d53bd3c6fc1eecd66aa1bd85eefd7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-18 |
| filingDate | 1999-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32e6395a758d51247f5e503dc4aa3ded http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c484516a58f445c3ae751cc47962bda |
| publicationDate | 2000-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20000029272-A |
| titleOfInvention | A method for forming the pattern of vapor deposited illuminant film |
| abstract | The present invention is to obtain an insulating film having heat resistance.n n n This invention improves heat resistance of the photosensitive resin film by irradiating an ultraviolet-ray, heating the photosensitive resin film pattern after exposure in the heat resistant temperature of +/- 10 degreeC of the said film pattern. |
| priorityDate | 1998-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 273.