| abstract |
The present invention relates to a process for purifying cryogenic fluids, in particular argon, nitrogen, helium or oxygen, containing N 2 O, C n H m or NO x impurities, wherein the method has an average size of 1.5 for cryogenic fluids to be purified. It is comprised by removing an impurity by contacting with the adsorbent particle of mm or less, Preferably it is 0.8-1.1 mm. This method recovers the purified cryogenic fluid containing less than 100 ppb of impurities, preferably less than 10 ppb. The process of the present invention can be used to produce ultrapure gases, particularly intended for use in the electronics industry. |