http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20000027374-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_526cb931f1382d6e016ee651d55e1365 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02178 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
| filingDate | 1998-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5f3130019147dea0e5b7de4b6608f36 |
| publicationDate | 2000-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20000027374-A |
| titleOfInvention | Contact manufacturing method of semiconductor device |
| abstract | According to the present invention, after forming the gate electrode and the transistor in order to form contact wires capable of minimizing substrate damage due to misalignment, the insulating film is subjected to two steps (first insulating film: an insulating film having a slow etching rate, and a second insulating film: etching rate). Fast insulating film), and only a partial region is subjected to blanket plasma etching to leave a part of the second insulating film on the sidewall of the first insulating film. Subsequently, when the photo process for contact patterning is performed, the spacer of the lower metal interconnect layer performs transient etching by using the characteristic that the second insulating layer has a lower etching speed than the first insulating layer (ie, the second insulating layer performs a kind of masking role). Complete the etch without receiving it. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100407987-B1 |
| priorityDate | 1998-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6517 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419555680 |
Total number of triples: 17.