http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20000020669-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b828305495e1cdb63947a3a18aa633d1 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F22-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L65-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1998-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e17fb58da52c7366242452c0fa81ead http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_689ee2a925df00eea8d66d2665866e83 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e7322b2681cc5e331bf5a9ff826a7f5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b8eeaaeb59b67dba8fb80e85d4a7daf |
| publicationDate | 2000-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20000020669-A |
| titleOfInvention | Chemically Amplified Positive Photoresist Composition |
| abstract | The present invention is a polymer having a repeating unit represented by the following general formula (I), having a polystyrene standard weight average molecular weight (Mw) of 3,000 to 50,000, a molecular weight distribution (Mw / Mn) of 1.0 to 2.0, and the following general formula (VI) The present invention relates to a chemically amplified positive photoresist composition comprising a low molecular weight compound, an acid generator, and a solvent.n n n (I)n n n Wherein R 1 and R 2 are methyl, ethyl, t-butyl, iso-propyl, cyclohexyl, adamantyl, bicyclo [2,2,1] heptane methyl, with 1 to 10 carbon atoms Linear or branched alkyl groups, cyclic alkyl groups, polycyclic alkyl groups (bi, tricyclic), and alkoxy alkyl groups, each independently. l, m, n and o are the numbers representing repeating units in the main chain, respectively, l + m + n + o is 1 and the content ratio of o has a value of 0.4 to 0.6.n n n (VI)n n n Wherein R 3 , R 4 represent a hydrogen atom and a hydroxyl group, R 5 represents a lower alkyl group, an alkyl group containing bicyclo [2.2.1] heptane (norbornane), an alkyl group containing adamantane, and a bicyclo [ 4.4.0] decalin represents an alkyl group containing, and each independently.n n n The chemically amplified positive photoresist composition of the present invention has excellent substrate adhesion and dry etching resistance, and is excellent in high resolution, heat resistance, and the like, and excellent resist patterns can be obtained regardless of the type of substrate. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100811394-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20000073149-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100604793-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100484701-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100500349-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100535149-B1 |
| priorityDate | 1998-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 115.