http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20000020137-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fa85b9509fe8e25d0162494c3a8bd37a
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F5-065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F5-066
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F5-06
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F5-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-20
filingDate 1998-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aea1bde30b3504f05bd201f85b7ad097
publicationDate 2000-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20000020137-A
titleOfInvention A precursor compound for chemical vapor deposition of an aluminum thin film and a method of manufacturing the same
abstract 1. TECHNICAL FIELD OF THE INVENTIONn n n The present invention relates to a precursor compound used to deposit an aluminum metal thin film, which is used as a wiring material of a semiconductor device, on a silicon substrate by chemical vapor deposition, a method for preparing the compound, and a method of depositing an aluminum thin film on a silicon substrate using the compound. The present invention provides an organometallic complex defined by the following Chemical Formula 1 and a method for producing the same.n n n <Formula 1>n n n H (R ') 2 Al: L n n n n In Formula 1, R 'is selected from alkyl having 1 to 4 carbon atoms, perfluoroalkyl, L is alkylalziridine, alkylazetidine, alkylpyrrolidine (Alkylazetidine) in heterocyclic amine ( Alkylpyrrolidine, Alkylpiperidine, Alkylhexamethyleneimine, Alkylheptamethyleneimine, Alkylmorphtamline, Alkylmorpholine, 1,4-Dialkylpiperazine (1,4-Dialkylpiperazine) Thiophene or thiopyran, n is an integer of 1 or 2.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100724084-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100316760-B1
priorityDate 1998-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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