| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_70259655d3f85d70aa8f580536549087
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_22f5d33cfbf4210cc6217665f0bb62d6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8d5bf0284021f351bfc3d317f645d7cd |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67034
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
| filingDate |
1999-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9a4c54fd97245773c288bb340318b9d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c6c383f3e662e937398bf3a165ab871
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6630f912e3b96952ce33fd43cc5e8d74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44f3846aefe6ca1b652efc7c19507243
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_817e047dcc7b3ae87e898466ac902fea |
| publicationDate |
2000-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20000011726-A |
| titleOfInvention |
Substrate treating method and apparatus |
| abstract |
The substrate processing apparatus of the present invention provides substrate processing means for performing the required processing on the processing substrate 12, and infrared or near infrared radiation emitted by the infrared radiation source 20 over the outer peripheral portion of the processing substrate 12. Means 30 for condensing and applying infrared or near-infrared radiation to the processing substrate 12, and detecting infrared or near-infrared radiation emitted from the processing substrate 12 causing multiple reflections within the processing substrate 12. Means 42 for performing, and means 60 for analyzing the detected infrared or near infrared radiation, and means for instant monitoring of the surface condition of the processing substrate 12, and monitored of the processing substrate 12. Means 52, 54 for controlling the substrate processing means based on the surface condition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150025144-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100685947-B1 |
| priorityDate |
1998-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |