| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
1998-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c05518316f8c852d190094e9aa65931
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_539d0e5b9fde676187a07cc8ff53eb75 |
| publicationDate |
2000-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20000010320-A |
| titleOfInvention |
Resist composition and pattern formation method using same |
| abstract |
A resist composition used in a TSI (Top Surface Imaging) process and a pattern forming method using the same are disclosed. In the present inventionn n n (a) a polymer having the following formula for use in chemically amplified resists,n n n n n n n n In the formula, R 1 is a C 6 to C 20 aromatic hydrocarbon, and the weight average molecular weight of the polymer is 3,000 to 7,000.n n n (b) provides a resist composition composed of a photoacid generator (PAG).n n n In the pattern formation method according to the present invention, the step of developing using a silylation reagent having the following formula is included. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100384810-B1 |
| priorityDate |
1998-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |