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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c8401bd1a86a10d5508942a53475fc38
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-00
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00
filingDate 1999-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55bdc53f62dbce19cfb074acaff52564
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d340db8b2cdd7f8c268a3f8a6fa45c02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fbb0ebd6ec587219408d40f07e947a2
publicationDate 2000-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20000006484-A
titleOfInvention Process to pretreat copper surfaces
abstract The present invention relates to a method of pretreatment of the copper surface such that a rigid bond with the organic gas is subsequently formed. This method is particularly used to firmly stack multilayer printed circuit boards and to securely attach resist to the copper surface of the printed circuit board.n n n The copper surface is first contacted with a first solution containing hydrogen peroxide, an acid on one species and a nitrogen-containing 5-membered heterocyclic compound 1 species on a heterocycle that does not have sulfur, selenium or telluride atoms. The copper surface is then sulfinic acid, selenic acid, telluric acid, a heterocyclic compound containing one species of sulfur, selenium and / or telluride atoms in a heterocycle, and sulfonyne, selenonitrile of the formula And a second solution containing an adhesion promoter compound on one species selected from the group consisting of tellurium salts:n n n n n n n n n n Wherein A is S, Se or Te,n n n R 1 , R 2 and R 3 are alkyl, substituted alkyl, alkenyl, phenyl, substituted phenyl, benzyl, cycloalkyl, substituted cycloalkyl, R 1 , R 2 and R 3 are the same or different,n n n X − is an anion of an inorganic or organic acid or hydroxide.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106969561-A
priorityDate 1998-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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