http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20000004206-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_526cb931f1382d6e016ee651d55e1365 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76819 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| filingDate | 1998-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc40e658584238808264d6822bf42c00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c190607acc64fb636b4bfd39c0fa1632 |
| publicationDate | 2000-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20000004206-A |
| titleOfInvention | S.O.G compound for planarization of semiconductor device and method of manufacturing same |
| abstract | 1. TECHNICAL FIELD OF THE INVENTIONn n n The present invention relates to an S. O. compound for planarization of semiconductor devices and a method of manufacturing the same.n n n 2. The technical problem to be solved by the inventionn n n As a result of the high integration of semiconductor devices, it is necessary to solve a step that occurs after SOG film formation.n n n 3. Summary of Solution to Inventionn n n In the synthesis of the SOG solution, a bifunctional group having an alkyl group of appropriate molecular weight is added to the side chain.n n n 4. Important uses of the inventionn n n Applied in semiconductor device manufacturing process. |
| priorityDate | 1998-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.