| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-118 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D137-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L45-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1998-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_612062c06356e438670f36311f433958 |
| publicationDate |
2000-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20000001479-A |
| titleOfInvention |
Photosensitive polymers, dissolution inhibitors and chemically amplified photoresist compositions comprising them |
| abstract |
Photosensitive polymers, dissolution inhibitors and chemically amplified photoresist compositions comprising them are disclosed. The photosensitive polymer according to the present invention is a polymer obtained by polymerizing a 5-norbornene-2-methanol derivative monomer having a side chain of an aliphatic hydrocarbon group having 1 to 20 carbon atoms and a maleic anhydride monomer. In addition, the dissolution inhibitor according to the present invention is a tricyclodecane derivative or a salsa sapogenin derivative in which a group which causes a chemical reaction by an acid is bonded to a functional group. The chemically amplified photoresist composition comprising the photosensitive polymer and / or dissolution inhibitor according to the present invention has high etching resistance and excellent adhesion to the underlying film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010054675-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150121662-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100468052-B1 |
| priorityDate |
1998-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |