| abstract |
The present invention provides a vaporizer having excellent heat transfer efficiency and chemical vapor deposition (CVD) while minimizing the clogging phenomenon and contamination from the vaporizer by maintaining the liquid raw material supply stage and the vaporization stage at a predetermined temperature precisely and precisely. Relates to a device.n n n The present invention is a vaporizer for a chemical vapor deposition apparatus for supplying a reaction raw material gas generated by vaporizing a liquid raw material to a reactor, the liquid is set to a first temperature at which the liquid raw material is not decomposed and supplies a constant amount of liquid raw material A raw material supply stage and a vaporization chamber having an inlet connected directly to the outlet of the liquid raw material supply stage and an outlet connected to the reactor therein and set at a second temperature at which the liquid raw material can be vaporized and supplied from the liquid raw material supply stage A vaporization stage for vaporizing the liquid raw material into a reaction raw material gas, first heating means for heating the vaporized stage to a second temperature, and a delivery gas into the vaporization chamber at a position adjacent to an outlet of the liquid raw material supply stage By spraying the liquid raw material supplied into the vaporization chamber into small droplets to promote vaporization of the liquid raw material. The reaction raw material gas produced in characterized in that the transmission consists of a gas supply means for discharging into the reactor through the vaporization chamber outlet. |