| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B25-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-02 |
| filingDate |
1999-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
1999-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-19990088545-A |
| titleOfInvention |
Silica-based coating film on substrate and coating solution therefor |
| abstract |
Tetraethoxysilane formed by hydrolysis in a relatively low concentration of an alcohol solvent, and then hydrolyzed in the presence of a basic catalyst such as ammonia using an aprotic polar solvent such as N-methylpyrrolidone instead of an alcohol solvent, and A unique coating solution containing a hydrolysis condensation product of a polyalkoxysilane compound such as monomethyltrimethoxysilane is applied onto the surface of the substrate, dried and then fired at 350 to 800 ° C. to give a silica having a low dielectric constant of 2.5 or less. A film can be formed on the surface of the substrate and provided as a planarization film or an interlayer insulating film. |
| priorityDate |
1998-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |