http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990083236-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-906 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02071 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 1999-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1999-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19990083236-A |
| titleOfInvention | REMOVAL OF POST-RIE POLYMER ON Al/Cu METAL LINE |
| abstract | A method of removing a post reactive ion etch sidewall polymer rail on an Al / Cu metal line of a semiconductor or microelectronic composite structure.n n n 1) supplying a mixture of etching gas and acid neutralizing gas to a vacuum chamber in which the composite structure is supported to form a water soluble material of the sidewall polymer rail remaining on the Al / Cu metal line from the RIE process; Removing the water soluble material with diionized water; And removing the photo-resist from the composite structure by a wet plasma process or chemical downstream etch method. or,n n n 2) performing a wet plasma process to strip a photo-resist layer of a previously RIE processed microelectronic composite structure or semiconductor;n n n Supplying a mixture of etching gas and acid neutralizing gas to a vacuum chamber in which the composite structure is supported to form a water soluble material of the sidewall polymer rail remaining on the Al / Cu metal line from a RIE process; Andn n n Disclosed is a method comprising removing the water soluble material with diionized water. |
| priorityDate | 1998-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.