http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990077899-A
Outgoing Links
Predicate | Object |
---|---|
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate | 1999-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 1999-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-19990077899-A |
titleOfInvention | Positive-working photosensitive composition |
abstract | The present invention provides a positive photosensitive composition comprising a basic nitrogen-containing compound (a) having a polycyclic structure represented by the general formula (I) and at least one compound (b) represented by the general formulas (II) to provide:n n n (In the above formulas, Y and Z may be the same or different and each represents a linear, branched or cyclic alkylene group which may contain a heteroatom or may be substituted, and the positive photosensitive composition may exhibit reduced sensitivity Without decreasing the width of the resist pattern with time between exposure and heat treatment, without showing the T-top deformation of the surface shape). |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100685318-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100390998-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101247623-B1 |
priorityDate | 1998-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 219.