http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990072757-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| filingDate | 1999-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1999-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19990072757-A |
| titleOfInvention | Photoresist compositions and methods and articles of manufacture comprising same |
| abstract | The present invention includes methods of using positive chemically amplified photoresist compositions that produce strong luminescent acids. The resist is coated onto a metal substrate that has undergone a rigorous firing step, for example, a metal substrate that has been heat-treated at least about 140 ° C. for at least 60 seconds. Combining a strong luminescent acid and a rigorous precoated substrate firing process provides a very high resolution resist relief image on a metal substrate. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102446355-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023149669-A1 |
| priorityDate | 1998-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 108.