http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990030656-A
Outgoing Links
| Predicate | Object |
|---|---|
| filingDate | 1997-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1999-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19990030656-A |
| titleOfInvention | Optical waveguide manufacturing method |
| abstract | Disclosed is a method of manufacturing an optical waveguide. The present invention forms a lower cladding layer and a core layer on the substrate. In this case, the core layer is formed of a silica layer, an optical polymer layer, or an oxide single crystal layer. Next, a mask pattern is formed on the core layer. Next, the exposed core layer is patterned by an etching method using an ICP device including a cathode electrode, an ICP coil (Inductively Coupled Plasma coil), and a chamber to which a first Radio Frequency power is applied. ) To form a waveguide. At this time, the etching method using the ICP device is performed by the following method. First, a substrate on which a mask pattern is formed is introduced onto a cathode electrode. Next, a first RF power is applied to the cathode electrode, a second RF power is applied to the ICP coil, a reaction gas containing a reaction gas is supplied to the chamber, and a plasma is generated to etch the exposed core layer. . Next, an upper cladding layer covering the waveguide is formed. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100418908-B1 |
| priorityDate | 1997-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 13.