http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990030226-A

Outgoing Links

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classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5256
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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76838
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32963
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-525
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8242
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-108
filingDate 1998-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1999-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-19990030226-A
titleOfInvention Endpoint detection method and apparatus
abstract A metal fuse structure and a method of manufacturing the same are disclosed. The method includes forming a fuse structure from a metallization layer, depositing a base oxide layer, ie, HDP oxide, over the fuse structure formed from the metallization layer, depositing a doped oxide layer over the base oxide layer, doped oxide Depositing a top oxide layer over the layer, etching through the top oxide layer, detecting an increased level of dopant species emitted when the doped oxide layer begins to be etched, the dopant species Terminating the etching when an increased level of is detected. At least a base oxide layer remains on the fuse structure formed from the metallization layer.
priorityDate 1997-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24404
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Total number of triples: 22.