http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990030226-A
Outgoing Links
Predicate | Object |
---|---|
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5256 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76838 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32963 |
classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-525 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8242 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-108 |
filingDate | 1998-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 1999-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-19990030226-A |
titleOfInvention | Endpoint detection method and apparatus |
abstract | A metal fuse structure and a method of manufacturing the same are disclosed. The method includes forming a fuse structure from a metallization layer, depositing a base oxide layer, ie, HDP oxide, over the fuse structure formed from the metallization layer, depositing a doped oxide layer over the base oxide layer, doped oxide Depositing a top oxide layer over the layer, etching through the top oxide layer, detecting an increased level of dopant species emitted when the doped oxide layer begins to be etched, the dopant species Terminating the etching when an increased level of is detected. At least a base oxide layer remains on the fuse structure formed from the metallization layer. |
priorityDate | 1997-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.