Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
filingDate |
1998-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
1999-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-19990029281-A |
titleOfInvention |
Silicon Nitride Etching |
abstract |
The present invention relates to a method of etching silicon nitride using a composition containing a fluoride-containing compound, a particular organic solvent and water. |
priorityDate |
1997-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |