http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990026084-A
Outgoing Links
| Predicate | Object |
|---|---|
| filingDate | 1997-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1999-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19990026084-A |
| titleOfInvention | Cleaning method that minimizes intrusion of side wall of contact hole |
| abstract | Disclosed is a contact hole cleaning method capable of suppressing damage occurring on a sidewall of a contact hole in a manufacturing process of a semiconductor device. To this end, the present invention comprises the steps of forming a contact hole on a semiconductor substrate on which a plurality of insulating films are formed, performing dry cleaning on the semiconductor substrate on which the contact hole is formed, and performing a dry cleaning on the semiconductor substrate. It provides a contact hole cleaning method comprising the step of performing a wet cleaning. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100600258-B1 |
| priorityDate | 1997-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 13.