| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-923
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S148-09 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823814
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2257
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2255
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-6659
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-225 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-225 |
| filingDate |
1996-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
1999-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-19990022636-A |
| titleOfInvention |
Shallow Depth Formation Method |
| abstract |
A doping sequence that reduces the cost and complexity of forming source / drain regions (11, 12) in complementary metal oxide silicon (CMOS) integrated circuit technology. The process is very shallow in depth, with the interference effects generated by patterned excimer laser annealing, dopant-saturated spin-on glass 21, silicide film contact structures 18, 19, and thin dielectric layers. Source and drain junctions 23 and 24 exhibiting low sheet and contact resistance. This process can be accomplished without using photolithography at all and without using an expensive vacuuming apparatus. The benefits of this process are broad and yield loss due to dopant contact at very shallow depths is eliminated. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100477473-B1 |
| priorityDate |
1995-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |