http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990014667-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3423 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3435 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3497 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3407 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34 |
| filingDate | 1995-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1999-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19990014667-A |
| titleOfInvention | Sputtering device with isolated coolant and sputtering target |
| abstract | The sputtering apparatus 10 according to the present invention includes a cathode assembly 21 formed of a cathode unit 22 having a movable magnet assembly and a cooling water source, and sealed to the rear surface 33 of the target to surround the cooling cavity 45. Is provided with a removable target assembly 23 comprising a replaceable and preferably reusable cooling jacket 40 and a replaceable target unit 25. The duct 50 is configured to automatically disconnect and reconnect the cooling cavity to the water source when the target assembly is removed from the cathode assembly and reconnected. The target unit comprises a sized sputtering material with a front sputtering surface 32 on the sputtering material, and has a rim 34 with a recess surrounding the sputtering surface. The rim is configured to form a vacuum seal up to the sputtering chamber wall and a waterproof seal up to the cooling jacket. Thus, the magnet assembly is isolated from contact with the coolant. The central connection, preferably a protruding hub 35, is centered behind the target unit, and is distorted from pressure and strain that tends to force the target material generally into the process chamber 13 into the center of the target. It is connected to the shaft 65 of the negative electrode assembly to support against. Preferably, the target 25 is made of an integral piece of sputtering material and may be part of the support plate 25b where the material allows or where the rim and hub are coupled to the target material to form the target unit. In each case, the rear of the target unit has, or is coated or treated to have the property of preventing penetration of contaminants from the original cooling water. |
| priorityDate | 1995-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 18.