http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19980086901-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1998-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1998-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19980086901-A |
| titleOfInvention | Positive photosensitive composition |
| abstract | A positive photosensitive composition that provides good sensitivity, resolution, and resist pattern, and sufficiently exhibits high dry etching resistance using an exposure light source of 250 nm or less, in particular 220 nm or less, generates (A) an acid by irradiation of actinic or radiation And (B) (i) at least one polycyclic aliphatic ring group, (ii) at least one ester group which decomposes under the action of an acid to increase solubility in an alkaline developer, and (iii) at the action of an acid, A resin containing at least one acetal group which increases the solubility in the developer, or (A) a compound which produces an acid by irradiation of actinic light or radiation, and (C) decomposes under the action of an acid, thereby increasing the solubility in an alkaline developer. It is decomposed by the action of a resin having a cyclic aliphatic ring group and an ester group and (D) acid, thereby increasing the solubility in an alkaline developer. Which are a resin having an aliphatic cyclic ring group and acetal. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100692264-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150028243-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100894260-B1 |
| priorityDate | 1997-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 509.