http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19980080143-A

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filingDate 1998-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1998-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-19980080143-A
titleOfInvention Chemical amplification resist
abstract The disclosed contents not only prevent the resist pattern after development from becoming T-shaped, but also have excellent resolution, depth of focus and dimensional accuracy, and increase the slope of the dose-dependent dose of dissolution rate, and chemically amplified resist with PAG. It relates to a chemically amplified resist which is a mixture of t-BOC protected polyhydroxystyrene polymers having different molecular weights, which are used as basic polymers. The preferred molecular weight ratio of this mixture is 1: 5 to 1:20, and the mixing ratio is preferably about 10 to 30 parts by weight of the low molecular weight polymer relative to 100 parts by weight of the high molecular weight polymer.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100745961-B1
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type http://data.epo.org/linked-data/def/patent/Publication

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