| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2001 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4586
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-14 |
| filingDate |
1998-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
1998-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-19980071011-A |
| titleOfInvention |
High Temperature and High Flow Rate Chemical Vapor Deposition Apparatus and Related Deposition Methods |
| abstract |
The present invention relates to an apparatus for providing a titanium layer from a titanium tetrachloride at a deposition rate of up to 200 microseconds per minute on a semiconductor substrate. In accordance with one embodiment of the present invention, a ceramic heater with an integrated RF plane against an RF capacitively powered floor allows PECVD deposition at a temperature of at least about 400 ° C. for more effective plasma processing. The heat choke separates the heater from its support shaft and reduces the heat change in the heater, reducing damage to the heater and improving temperature uniformity. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101127026-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7381673-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100722592-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100841148-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100934827-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100883725-B1 |
| priorityDate |
1997-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |